Impactful Study of F-shaped Tunnel FET

نویسندگان

چکیده

In this proposed work, a novel single gate F-shaped channel tunnel field effect transistor (SG-FC-TFET) is and investigated. The impact of thickness the source region lateral tunneling length between oxide edge on analog radio frequency parameters are investigated with appropriate drain through 2D-TCAD tool. slender shape enhanced electric crowding at corners which reflect in terms high ON-current (Ion). Ion device increased up to 10? 4 A/?m reduced sub-threshold swing (SS) 7.3 mV/decade minimum turn-ON voltage (Von = 0.28 V). analog/RF SG-FC-TFET optimized.

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ژورنال

عنوان ژورنال: Silicon

سال: 2021

ISSN: ['1876-9918', '1876-990X']

DOI: https://doi.org/10.1007/s12633-021-01319-6